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Industry 制造业
Company Introduction 拓荆科技主要从事高端半导体专用设备的研发、生产、销售和技术服务。公司聚焦的半导体薄膜沉积设备与光刻机、刻蚀机共同构成芯片制造三大主设备。公司主要产品包括等离子体增强化学气相沉积（PECVD）设备、原子层沉积（ALD）设备和次常压化学气相沉积（SACVD）设备三个产品系列，已广泛应用于国内晶圆厂14nm 及以上制程集成电路制造产线，并已展开10nm 及以下制程产品验证测试。 拓荆科技是国内唯一一家产业化应用的集成电路PECVD、SACVD 设备厂商，以前后两任董事长为核心的五名国家级海外高层次专家组建起一支国际化的技术团队，形成了三大类半导体薄膜设备产品系列，先后四次承担国家重大科技专项/课题，被中国半导体行业协会评为2016 年度、2017 年度、2019 年度“中国半导体设备五强企业”。 公司自设立以来立足自主创新，通过对薄膜沉积设备核心技术的构建，产品在实现薄膜性能参数的同时，满足了综合生产成本相对较低的商业经济性指标。产品已广泛用于中芯国际、华虹集团、长江存储、长鑫存储、厦门联芯、燕东微电子等国内主流晶圆厂产线。公司凭借长期技术研发和工艺积累，打破国际厂商对国内市场的垄断，与国际寡头直接竞争。报告期内，公司在研产品已发往某国际领先晶圆厂参与其先进制程工艺研发。 公司的产品已适配国内最先进的28/14nm 逻辑芯片、19/17nm DRAM 芯片和64/128 层3D NAND FLASH 晶圆制造产线。其中，PECVD 设备已全面覆盖逻辑电路、DRAM 存储、FLASH 闪存集成电路制造各技术节点产线SiO2、SiN、SiON、BPSG、TEOS 等多种通用介质材料薄膜沉积工序，并具备向更先进技术节点拓展的延伸性。基于现有PECVD 产品平台，公司研发了LokⅠ、LokⅡ、ACHM、ADCⅠ等先进介质材料工艺，拓宽公司PECVD 产品在晶圆制造产线薄膜沉积工序的应用。
Main Business 高端半导体专用设备的研发、生产、销售和技术服务。
Legal Representative 刘静
Top Executives
董事长：吕光泉
董事：刘静,杨卓,杨柳,尹志尧,齐雷
独立董事：赵国庆,黄宏彬,刘胜
Top 5 Shareholder
Shareholder name Nature Holding Date
国家集成电路产业投资基金股份有限公司限售股19.76%31/03/2024
国投（上海）创业投资管理有限公司－国投（上海）科技成果转化创业投资基金企业（有限合伙）限售股13.60%31/03/2024
中微半导体设备（上海）股份有限公司流通A股7.37%31/03/2024
招商银行股份有限公司－华夏上证科创板50成份交易型开放式指数证券投资基金流通A股3.60%31/03/2024
中合盛资本管理有限公司－青岛润扬嘉禾投资合伙企业（有限合伙）流通A股2.11%31/03/2024
Company Secretary 赵曦
Solicitors 北京市中伦律师事务所
Auditors 天健会计师事务所（特殊普通合伙）
Tel No 024188000-8089
Fax No 024188000-8080
Website www.piotech.cn
Email ir@piotech.cn
Company Address
Register: 辽宁省沈阳市浑南区水家900号
Office: 辽宁省沈阳市浑南区水家900号
Listing Date 20/04/2022
Shares Capital
Shares Capital: 188,188,255
Total A Share: 188,188,255
Listed A Share: 104,079,792
Non-tradable A Share: 84,108,463
Other Share: 0
Total B Share: 0
Total H Share: 0
EPS(RMB)* ¥ 3.540
DPS(RMB)* ¥ 0.350
NBV Per Share(RMB)* ¥ 24.411
Market Capitalization(RMB) 18.742B
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 : Eligible Stock for SZ-HK Northbound trade (For all investors/ For institutional professional investors only)
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 : Eligible Stock for SZ-HK Ex-Northbound trade (sell only)
* Unadjusted Data
Information provided by: etnet
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